# atomicoat — Atomic Layer Deposition

> Atomic Layer Deposition (iPhone/iPad app by AtomiCoat.)

- Source: https://appshunter.io/ios/app/atomicoat/id6740042572 (this page in markdown: same URL + `.md`)
- Developer: [AtomiCoat](https://appshunter.io/developer/1817031875)
- Category: Business, Productivity
- Price: Free
- Age rating: 4+
- Requires: iOS 13.0 · 25 MB
- Languages: American English
- Released: 2025-01-08
- Data updated: 2026-03-12
- User reviews in markdown: https://appshunter.io/ios/app/atomicoat/id6740042572/reviews.md

## What is atomicoat?

ALD Control System – Precision in Atomic Layer Deposition

The ALD Control System is a powerful tool designed for managing and monitoring Atomic Layer Deposition (ALD) processes with precision, reliability, and ease. Tailored for researchers, engineers, and labs, our system simplifies complex deposition workflows, ensuring high-quality thin-film production through advanced automation and real-time monitoring.

Key Features:
	•	Recipe Management:
Create, edit, and execute predefined process recipes for consistent deposition cycles. Control each step with precise parameter settings, including gas flow rates, temperature, and pressure.
	•	Real-Time Monitoring:
Track critical parameters such as chamber conditions, component states, and sensor readings in real time. Ensure process accuracy and safety with continuous monitoring.
	•	Automated Experiment Recording:
Record every process execution as an “experiment” with detailed logs of parameters, deviations, and alerts. Access structured data for later review, analysis, and optimization.
	•	Session Management:
Enforce single-operator sessions for focused control and accountability. Secure access ensures only authorized users can operate the machine.
	•	Data Logging and Analysis:
Automatically collect and store process data, allowing for in-depth analysis, quality control, and process improvement over time.
	•	Built-In Safety Features:
Continuous validation of process parameters with automatic safety interventions. Prevent errors and maintain optimal conditions with smart alerts and safeguards.

Designed for Professionals:
	•	Independent Machine Control: Each machine operates individually for maximum precision and safety.
	•	Scalable Architecture: Ideal for labs and industries managing multiple deposition machines.
	•	User-Friendly Interface: A streamlined design enables operators to control processes with minimal training.

Whether you’re performing R&D, optimizing deposition recipes, or scaling up production, the ALD Control System delivers the tools and insights you need to achieve consistent and high-quality results.


## Version history (last 5 releases)

### 5.2.0 — 2025-11-11

What's New in Version 5.2.0

Transform your ALD process monitoring with powerful new features!

NEW: Full-Screen Graph Analysis
Tap any mini graph to expand it with extended time windows (5 minutes to 6 hours), interactive tooltips, and pause/resume controls for detailed analysis.

Enhanced Real-Time Performance
Experience faster, more reliable real-time updates with our improved telemetry system.

Better Reliability
Fixed critical bugs and improved validation to ensure your recipes execute flawlessly.

Polished Experience
Smoother animations, better visual feedback, and an overall more polished user experience.

### 5.1.0 — 2025-11-03

Performance & UI Improvements

  • Improved recipe selection dialog with faster loading and cleaner last-run display
  • Enhanced full-screen graphs with smarter axis labels for better readability
  • Added loop iteration indicators to recipe steps (e.g., "Step 3 (Loop 2/5)")
  • Better error handling - graphs now display even when data is incomplete
  • Performance monitoring improvements for real-time telemetry tracking
  • Bug fixes and stability improvements

### 3.0 — 2025-11-01

Major Update - Enhanced Performance and Stability

NEW FEATURES:
- Improved real-time sensor data monitoring with faster updates
- Enhanced recipe execution controls for better process management
- Optimized session management with automatic tracking
- Refined operator interface for smoother navigation

IMPROVEMENTS:
- Faster app startup and reduced memory usage
- Better connection stability with ALD hardware
- Enhanced error handling and recovery
- Improved responsiveness across all screens

BUG FIXES:
- Resolved authentication token refresh issues
- Fixed component parameter update delays
- Improved real-time data synchronization
- Enhanced stability for long-running processes

TECHNICAL UPDATES:
- Updated iOS compatibility for latest devices
- Security enhancements and performance optimizations
- Improved database synchronization
- Better offline mode handling

Thank you for using AtomiCoat! We are committed to providing the best ALD process control experience.

### 2.0 — 2025-05-07

New UI sleek design and look!

### 1.0 — 2025-01-08

No release notes.

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*Data collected daily from the US App Store and indexed by [AppsHunter](https://appshunter.io/). User reviews are verbatim App Store reviews. Ratings, prices and chart positions refresh continuously; this snapshot is from 2026-03-12.*